| 摘要 |
An optical stereolithographic apparatus performs optical stereolithography by preparing a mask on a light-transmissible member ( 31 ) on the basis of data for one layer with respect to optical stereolithography, exposing an unhardened resin layer ( 96 ) of photohardenable resin to light through the mask, and repeating an exposure operation. The optical stereolithographic apparatus has an optical system in which the light-transmissible member ( 31 ) and the unhardened resin layer ( 96 ) are spaced from each other at a predetermined distance, and the unhardened resin layer ( 96 ) of the photohardenable resin is subjected to a projection exposure through the mask.
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