发明名称 PARTICLE REMOVING APPARATUS OF SEMICONDUCTOR EQUIPMENT
摘要 A particle remover of a semiconductor manufacturing apparatus is provided to effectively remove dusts from an upper surface of an object by flowing air at a high speed according to a Bernoulli law. A particle remover of a semiconductor manufacturing apparatus includes an air injection unit, a base unit(20), and a dust collector(30). The air injection unit provides ionized compressed air at a constant speed. The base unit is arranged to be close to an upper surface of an object and includes air injection holes and rising curves at both ends thereof. The air injection hole blows the air from the air injection unit to the upper surface of the object to remove dusts from the object. The dusts are guided upwards along the rising curve. The dust collector is arranged to be coupled with the rising curve, and sucks in the air and the dust.
申请公布号 KR20080005630(A) 申请公布日期 2008.01.15
申请号 KR20060064171 申请日期 2006.07.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HYUN JUNG;KIM, GWANG EUN;CHOI, YOUNG YIK;KIM, TAE HYEONG;WOO, YOUNG PHIL;KIM, MIN KYOON
分类号 H01L21/304 主分类号 H01L21/304
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