APPARATUS AND METHOD FOR GLASS ETCHING

摘要

A method and an apparatus for etching a glass are provided to completely remove a liquid material from a glass surface by using a rinsing bath separated from a drying bath. A surface of a glass is etched using fluoric acid in an etching bath(100). A bubble generator is formed at a lower portion of the etching bath. A surface of the etched glass is cleansed using UPW(Ultra Pure Water) in a cleaning bath(200). A bubble generator is formed at a lower portion of the cleaning bath. The surface of the glass is cleaned using the UPW and preliminarily dries the glass using dry air in a rinsing and drying bath(300). The surface of the glass is completely dried using the dry air in a drying bath(400).