| 发明名称 |
Lift-off positive resist composition |
| 摘要 |
A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin.
|
| 申请公布号 |
US7318992(B2) |
申请公布日期 |
2008.01.15 |
| 申请号 |
US20050091666 |
申请日期 |
2005.03.28 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KAWANA DAISUKE;YAMADA TOMOTAKA;SHIMBORI HIROSHI;TAMURA KOKI;ANDO TOMOYUKI;HOSONO TAKAYUKI |
| 分类号 |
G03F7/039;G03C1/492;G03F7/004;G03F7/075 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
