| 摘要 |
An apparatus for aligning a substrate is provided to minimize continuous friction of a notch of a semiconductor substrate and an align roller by installing an idle roller at one side of an align roller such that the idle roller comes in contact with the align roller and the outer surface of the semiconductor substrate. A frame structure is made of a hexahedral shape whose upper portion is open wherein semiconductor substrates are placed on the frame structure. A driving roller(52) is installed at one side with respect to the central axes of the semiconductor substrates in the frame structure and comes in contact with the outer surface of the semiconductor substrate in an align process to rotate the semiconductor substrate. A first idle roller is installed in the frame structure, symmetrical to the driving roller. An align member(50) includes a second idle roller(54), an align roller and a third idle roller(56). The second idle roller can rotate together with the driving roller, coming in contact with the driving roller. The align roller comes in contact with the second idle roller to rotate together with the second idle roller, including grooves gearing with notches of the semiconductor substrate. The third idle roller supports the semiconductor substrate, coming in contact with the outer surfaces of the second idle roller and the align roller. The third idle roller can support the lower portion of the semiconductor substrate whose notch is inserted into the align roller.
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