WAFER HOLDER, METHOD FOR PRODUCING THE SAME, AND SEMICONDUCTOR PRODUCTION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a wafer holder applicable to processing of a wafer at a temperature not higher than normal temperature and especially suitable for use in a CVD system. SOLUTION: A wafer holder 1 having a wafer mounting surface is composed of a ceramic, and internally has a channel 3 which passes a refrigerant for cooling the wafer holder 1, and is preferably further equipped with an electrode 2 for generating high frequency wave. The wafer holder 1 can be produced by forming the channel 3 on one sheet of a ceramic substrate, bonding at least another sheet of a ceramic substrate to the one ceramic substrate so as to cover the channel 3, and further bonding a ceramic substrate, on which the electrode 2 for generating high frequency wave is formed, preferably. COPYRIGHT: (C)2008,JPO&INPIT