| 摘要 |
PROBLEM TO BE SOLVED: To provide a spin cup of a single-wafer basis semiconductor wafer cleaning/drying device wherein a component such as a spin cup and a wafer or the like constituting the wafer cleaning/drying device is hardly charged with static electricity, thus extremely reducing and removing discharge of static electricity in cleaning and drying of a wafer, a wafer is hardly damaged, a wafer does not attract dust, and an cleaning solution is hardly contaminated with dust. SOLUTION: The spin cup of a wafer cleaning/drying device which rotates a wafer housed in the spin cup and can at least clean and dry the wafer consists of a box-like spin cup base material housing and holding a wafer, and a cover provided to prevent wafer cleaning solution from scattering and flowing out to an upper part of the spin cup base material part. The spin cup base material is formed of fluororesin, and at least part of the cover is formed of a conductive filler and a charge prevention material comprising the fluororesin. COPYRIGHT: (C)2008,JPO&INPIT
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