MICROPATTERN-FORMING RESIN COMPOSITON AND METHOD FOR FORMING MICROPATTERN USING THE SAME

摘要

Disclosed is a micropattern-forming resin composition that can be used to reduce the area or width of recessed portions in a semiconductor lithographic process. The resin composition is coated on a photoresist pattern layer and comprises an aqueous alcoholic or alkaline solution and a water-soluble polymer. The resin composition can be used reduce the width of recessed portions of the photoresist pattern layer. Therefore, the use of the resin composition enables the formation of a micropattern that overcomes the limitation of wavelength.