| 摘要 |
An evaporator with controllable height is provided to keep deposition density uniformly by controlling a distance between a substrate and the evaporator variably in a substrate depositing process. An evaporator with controllable height includes a crucible(100), a lifting unit(200), and a moving unit(300). The crucible keeps a deposited material inside. A material of the crucible is a conductive material or a non-conductive material like ceramic and silica. The lifting unit controls the height of the crucible. The lifting unit moves the crucible up and down. A lower part of the lifting unit is stuck to the moving unit and the upper part thereof is adhered to the crucible. The moving unit moves the crucible on a plain surface. The moving unit is formed differently according to a kind of the crucible.
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