| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid draining method to be employed in forming a thin film on a substrate using a dip coating method which enables the complete removal of a sagging liquid accumulating and sticking onto a lower edge of a substrate by air to help form a thin film of a uniform thickness on the substrate, and a method for preparing a thin film employing the above method. SOLUTION: The liquid draining method to be employed in preparing a thin film for removing a sagging coating-liquid sticking to a substrate upon vertically pulling up a substrate 230 dipped in the coating liquid in the step of preparing a thin film using a dip coating method comprises the step of blowing air onto the substrate 230 being pulled up while properly adjusting the force of the air according to the position of the substrate 230 and the nature of the material thereof and the step of more strongly blowing air, upon detecting the lower edge 231 of the substrate 230, onto the lower edge 231 relative to the other part of the substrate 230. The apparatus 200 for preparing a thin film employs the above method. COPYRIGHT: (C)2008,JPO&INPIT
|
