发明名称 Process for Determining Local Emissivity Profile of Suprathermal Electrons
摘要 The invention concerns a process for determining a local emissivity profile of suprathermal electrons coming from an ionized gas ring placed in a toric vessel, with the use of tomographic inversion by means of Bessel functions Jo of order 0 which exploits line-integrated measurements acquired by current real-time Hard-X-Ray diagnostics.
申请公布号 US2008010028(A1) 申请公布日期 2008.01.10
申请号 US20050793870 申请日期 2005.12.15
申请人 COMMISSARIAT AL'ENERGIE ATOMIQUE 发明人 MAZON DIDIER;BARANA OLIVEIRO;PEYSSON YVES
分类号 G06F19/00 主分类号 G06F19/00
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