发明名称 |
Process for Determining Local Emissivity Profile of Suprathermal Electrons |
摘要 |
The invention concerns a process for determining a local emissivity profile of suprathermal electrons coming from an ionized gas ring placed in a toric vessel, with the use of tomographic inversion by means of Bessel functions Jo of order 0 which exploits line-integrated measurements acquired by current real-time Hard-X-Ray diagnostics.
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申请公布号 |
US2008010028(A1) |
申请公布日期 |
2008.01.10 |
申请号 |
US20050793870 |
申请日期 |
2005.12.15 |
申请人 |
COMMISSARIAT AL'ENERGIE ATOMIQUE |
发明人 |
MAZON DIDIER;BARANA OLIVEIRO;PEYSSON YVES |
分类号 |
G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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