| 发明名称 |
AFTERTREATMENT METHOD FOR AMORPHOUS CARBON FILM |
| 摘要 |
<p>Provided is a further aftertreatment method to be performed to an amorphous carbon film to which treatment including heating has been performed after a film is formed on a substrate. The treatment for preventing oxidation of the amorphous carbon film is performed immediately after the treatment including heating.</p> |
| 申请公布号 |
WO2008004584(A1) |
申请公布日期 |
2008.01.10 |
| 申请号 |
WO2007JP63376 |
申请日期 |
2007.07.04 |
| 申请人 |
ISHIKAWA, HIRAKU;TOKYO ELECTRON LIMITED |
发明人 |
ISHIKAWA, HIRAKU |
| 分类号 |
H01L21/316 |
主分类号 |
H01L21/316 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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