| 发明名称 |
METHOD OF CLEANING, AND PROCESS FOR PRODUCING, GLASS SUBSTRATE, AND MAGNETIC DISK UTILIZING THE SAME |
| 摘要 |
<p>A method of cleaning glass substrate (G), in which without complication of cleaning operation, abrasives and foreign matter can be removed with certainty. The method comprises scrub cleaning of glass substrate (G) using, among two or more types of cleaning fluids (3) with different rates of Si element elution, cleaning fluid (3) with the highest rate of Si element elution in the first stage and cleaning fluid (3) with the lowest rate of Si element elution in the final stage.</p> |
| 申请公布号 |
WO2008004468(A1) |
申请公布日期 |
2008.01.10 |
| 申请号 |
WO2007JP62864 |
申请日期 |
2007.06.27 |
| 申请人 |
KONICA MINOLTA OPTO, INC.;KAWAI, HIDEKI;NAKATSUJI, YUKITOSHI;SAWADA, HIROAKI;SAEKI, SHINICHI |
发明人 |
KAWAI, HIDEKI;NAKATSUJI, YUKITOSHI;SAWADA, HIROAKI;SAEKI, SHINICHI |
| 分类号 |
B08B3/08;B08B7/04;G11B5/73;G11B5/84 |
主分类号 |
B08B3/08 |
| 代理机构 |
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