发明名称 METHOD OF MANUFACTURING FILM TYPE ANTENNA USING SPUTTERING PROCESS
摘要 A method of manufacturing a film type antenna using a sputtering process is provided to improve an electroconductivity and a radiation property by forming an antenna pattern without impurities by using a sputtering process at the time of forming the antenna pattern on a carrier film. A method of manufacturing a film type antenna includes the steps of: preparing a carrier film(21) made of an insulating polymer material(a); forming an antenna radiator(23) on at least one surface of the carrier film by a sputtering process or a deposition process(b); inserting the carrier film in which the antenna radiator is formed into a mold(24) of a mobile communication terminal case shape(c); and forming a mobile communication terminal case(29) integratedly coupled with the carrier film in which the antenna radiator is formed by inserting a molding material into the mold(d). The step of forming the antenna radiator includes the steps of: attaching a masking tape in which a desired radiator pattern is bored onto at least one surface of the carrier film; sputtering a surface of the carrier film to which the masking tape is attached with a metal constituting the radiator; and removing the masking tape from the carrier film.
申请公布号 KR20080004656(A) 申请公布日期 2008.01.10
申请号 KR20060063234 申请日期 2006.07.06
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 SUNG, JAE SUK;KIM, HAG BONG;KIM, SANG HEE;GO, HEUNG SUK;KIM, JEONG KON
分类号 H01Q1/38;H01Q1/24 主分类号 H01Q1/38
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