COMPOUND, POLYMER COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a novel compound, a polymer compound, a positive resist composition containing the polymer compound, and a resist pattern formation method using the positive resist composition.

SOLUTION: The compound is represented by formula (I). The polymer compound comprises structural units (a1) represented by formula (II). In formulae (I) and (II), R1is a hydrogen atom or a methyl group; R2and R3are each independently a hydrogen atom or a 1-5C alkyl group; n is an integer of 0-3; and Z is a 4-12C alicyclic group having a fluorine atom and/or a fluoroalkyl group as substituents.

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