| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily detect a local CD error of a pattern of a sample to be inspected. <P>SOLUTION: A pattern inspection device comprises a similar peripheral pattern exploring unit 14 that finds a plurality of similar peripheral patterns which are at the periphery of a specified pattern in the sample to be inspected and similar to the specified pattern, a nonsimilarity calculating unit 20 which finds nonsimilarity between the specified pattern and a similar peripheral pattern, a variance evaluating unit 22 which excludes an allowable error from the nonsimilarity and finds a local CD error judgement value, and a local CD error judges unit 24 which judges a local CD error if the local CD error judgement value exceeds a threshold when the distance between the specified pattern and similar peripheral pattern increases. <P>COPYRIGHT: (C)2008,JPO&INPIT |
