SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent a process liquid from leaking outside a processing chamber along a surface of a substrate. SOLUTION: A substrate processing apparatus comprises a transport mechanism 1; a development processor 12 having a processing chamber 121 that supplies a substrate S with a developing solution to perform development processing; and a controller 60 for controlling them. A detection mechanism 7 capable of detecting the transport state of the substrate S is disposed near an opening 15 upstream of the development processor 12. An outflow prevention device 20 having an air nozzle 21 capable of supplying a high pressure air that flows towards the substrate S from the upstream to the downstream is located at immediate upstream of the development processor 12. Upon determination that the substrate S is stagnating at the position of the opening 15 based on the detection of the transport state of the substrate S by the detection mechanism 7, the controller 60 operates the outflow prevention device 20 in order to prevent the developing solution from leaking out from the development processing chamber 121 along the surface of the substrate S. COPYRIGHT: (C)2008,JPO&INPIT