发明名称 MANUFACTURING METHOD OF PATTERNED SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a patterned substrate on which a high-resolution pattern of a layer made of a functional material is formed. SOLUTION: The manufacturing method of a patterned substrate includes the steps of forming a water-repellent thin film (A) of a photo-degradable material decomposed by irradiation with light to lower its water repellency, irradiating the thin film (A) with light to decompose the photo-degradable material in the section of the film irradiated with light to control the lyophilicity of the section irradiated with light to a liquid containing the functional material and applying the liquid containing the functional material to the section irradiated with light to form the pattern of the layer made of the functional material on the surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008000733(A) 申请公布日期 2008.01.10
申请号 JP20060175460 申请日期 2006.06.26
申请人 ASAHI GLASS CO LTD 发明人 HOSHINO YASUTERU;HIRAKOSO HIDEYUKI
分类号 B05D3/06;B05D5/00;G02B5/20;H01L21/3205;H01L51/50;H05B33/10;H05B33/14;H05B33/22;H05K3/10 主分类号 B05D3/06
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