| 发明名称 |
Graded spin-on organic antireflective coating for photolithography |
| 摘要 |
An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
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| 申请公布号 |
US2008008955(A1) |
申请公布日期 |
2008.01.10 |
| 申请号 |
US20060473338 |
申请日期 |
2006.06.23 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BRODSKY COLIN J.;BURNS SEAN D.;GOLDFARB DARIO L.;LERCEL MICHAEL;MEDEIROS DAVID R.;PFEIFFER DIRK;SANDERS DANIEL P.;SCHEER STEVEN A.;VYKLICKY LIBOR |
| 分类号 |
G03C1/00 |
主分类号 |
G03C1/00 |
| 代理机构 |
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代理人 |
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