发明名称 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device that is excellent in write and read characteristics and is easy to manufacture; and to provide a method of manufacturing the same. <P>SOLUTION: The nonvolatile semiconductor memory device has: a plurality of source/drain regions 11 formed approximately in parallel; a semiconductor substrate 1 having a depression 12 formed between the plurality of source/drain regions 11; an electric charge accumulation gate 3 formed in the depression 12 of the semiconductor substrate 1; and a plurality of conductive gates 6 that intersects the plurality of source/drain regions 11 and is arranged on the accumulation gate 3 with an insulating layer in between. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008004832(A) 申请公布日期 2008.01.10
申请号 JP20060174172 申请日期 2006.06.23
申请人 TOSHIBA CORP 发明人 NAKAUCHI TAKAHIRO;NARUGE KIYOMI
分类号 H01L21/8247;G11C16/04;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/8247
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