发明名称 |
NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor memory device that is excellent in write and read characteristics and is easy to manufacture; and to provide a method of manufacturing the same. <P>SOLUTION: The nonvolatile semiconductor memory device has: a plurality of source/drain regions 11 formed approximately in parallel; a semiconductor substrate 1 having a depression 12 formed between the plurality of source/drain regions 11; an electric charge accumulation gate 3 formed in the depression 12 of the semiconductor substrate 1; and a plurality of conductive gates 6 that intersects the plurality of source/drain regions 11 and is arranged on the accumulation gate 3 with an insulating layer in between. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008004832(A) |
申请公布日期 |
2008.01.10 |
申请号 |
JP20060174172 |
申请日期 |
2006.06.23 |
申请人 |
TOSHIBA CORP |
发明人 |
NAKAUCHI TAKAHIRO;NARUGE KIYOMI |
分类号 |
H01L21/8247;G11C16/04;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L21/8247 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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