发明名称 Buried pattern substrate and manufacturing method thereof
摘要 A buried pattern substrate and a manufacturing method thereof are disclosed. A method of manufacturing a buried pattern substrate having a circuit pattern formed on a surface, in which the circuit pattern is connected electrically by a stud bump, includes (a) forming the circuit pattern and the stud bump by depositing a plating layer selectively on a seed layer of a carrier film, where the seed layer is laminated on a surface of the carrier film, (b) laminating and pressing the carrier film on an insulation layer such that the circuit pattern and the stud bump face the insulation layer, and (c) removing the carrier film and the seed layer, allows the circuit interconnection to be realized using a copper (Cu) stud bump, so that a drilling process for interconnection is unnecessary, the degree of freedom for circuit design is improved, a via land is made unnecessary and the size of a via is small, to allow higher density in a circuit.
申请公布号 US2008009128(A1) 申请公布日期 2008.01.10
申请号 US20070708339 申请日期 2007.02.21
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 OKABE SHUHICHI;KANG MYUNG-SAM;PARK JUNG-HYUN;JUNG HOE-KU;KIM JI-EUN
分类号 H01L21/44 主分类号 H01L21/44
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