发明名称 Non-volatile memory device including variable resistance material and method of fabricating the same
摘要 Provided is a non-volatile memory device including a variable resistance material and method of fabricating the same. The non-volatile memory device may include a lower electrode, an intermediate layer on the lower electrode including one material selected from the group consisting of HfO, ZnO, InZnO, and ITO, a variable resistance material layer on the intermediate layer, and an upper electrode on the variable resistance material layer. A memory device having multi-level bipolar switching characteristics based upon the size of the device may be provided.
申请公布号 US2008007988(A1) 申请公布日期 2008.01.10
申请号 US20070802661 申请日期 2007.05.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 AHN SEUNG-EON;LEE MYOUNG-JAE;KIM DONG-CHUL
分类号 G11C11/24;H01L21/00;H01L21/20 主分类号 G11C11/24
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