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发明名称
Arbeitsstufe, Fokusstrahl-Arbeitsvorrichtung und Fokusstrahl-Arbeitsverfahren
摘要
申请公布号
DE112006000517(T5)
申请公布日期
2008.01.10
申请号
DE200611000517T
申请日期
2006.02.21
申请人
SII NANOTECHNOLOGY INC.
发明人
ADACHI, TATSUYA
分类号
G01N1/28;G01N1/32;H01J37/20;H01J37/317
主分类号
G01N1/28
代理机构
代理人
主权项
地址
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