发明名称 PHOTOSENSITIVE RESIN COMPOSITION, BUMP FOR CONTROL OF LIQUID CRYSTAL ALIGNMENT USING THE SAME AND METHOD FOR FORMING BUMP FOR CONTROL OF LIQUID CRYSTAL ALIGNMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for suppressing occurrence of residues after development on an electrode formed on a substrate, bumps for control of liquid crystal alignment formed from the photosensitive resin composition, and a method for forming bumps for control of liquid crystal alignment. <P>SOLUTION: The photosensitive resin composition which is disposed in a liquid crystal cell using a multiply divided vertical alignment system and forms bumps for controlling alignment of the liquid crystal on an electrode contains a pigment (C) and a pigment dispersant (D). <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008003321(A) 申请公布日期 2008.01.10
申请号 JP20060172876 申请日期 2006.06.22
申请人 TOKYO OHKA KOGYO CO LTD 发明人 UCHIGAWA KIYOSHI;OUCHI YASUHIDE;ONISHI HIROYUKI
分类号 G03F7/004;G02F1/1337;G03F7/32 主分类号 G03F7/004
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