| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a micropattern with high accuracy and sufficient manufacturing process margin without using a photomask involving complicated manufacturing process and high manufacturing cost such as a Levenson type phase shift mask. <P>SOLUTION: Double exposure is performed by using a pair of photomasks 1 and 2 such as an ordinary chrome mask or a half-tone phase shift mask or the like which is not the Levenson type phase shift mask, and a pattern is transferred onto a photoresist. Here, when performing exposure with the photomask 2 for forming a finer pattern, double pole illumination is used as an illumination system. <P>COPYRIGHT: (C)2008,JPO&INPIT |
