发明名称 |
METHOD FOR MANUFACTURING CONDENSING SUBSTRATE AND METHOD FOR MANUFACTURING ELECTROOPTIC DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a condensing substrate having excellent optical properties with a high degree of precision. <P>SOLUTION: The method for manufacturing a condensing substrate comprises a process for forming a metallic foundation layer 62 by forming a film of a metallic material on one surface side of a substrate 61 by a plating method; a process for forming a pattern of a resist mask 64 on the metallic foundation layer 62; a process for forming a metallic mask 65 by forming a film of a metallic material on the metallic foundation layer 62 by a plating method through the resist mask 64; a process for removing the resist mask 64; a process for removing the metallic foundation layer 62 in the region where the resist mask 64 has been removed; and a process for partially removing the substrate 61 by executing dry etching processing to the substrate 61 through the metallic mask 65, and forming a groove part 67 on the substrate 61. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008003292(A) |
申请公布日期 |
2008.01.10 |
申请号 |
JP20060172542 |
申请日期 |
2006.06.22 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SHINPO AKIRA;UEJIMA SHUNJI;FURUHATA HIDEMICHI |
分类号 |
G02B5/02;G02F1/1335;G09F9/00 |
主分类号 |
G02B5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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