发明名称 METHOD FOR MANUFACTURING CONDENSING SUBSTRATE AND METHOD FOR MANUFACTURING ELECTROOPTIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a condensing substrate having excellent optical properties with a high degree of precision. <P>SOLUTION: The method for manufacturing a condensing substrate comprises a process for forming a metallic foundation layer 62 by forming a film of a metallic material on one surface side of a substrate 61 by a plating method; a process for forming a pattern of a resist mask 64 on the metallic foundation layer 62; a process for forming a metallic mask 65 by forming a film of a metallic material on the metallic foundation layer 62 by a plating method through the resist mask 64; a process for removing the resist mask 64; a process for removing the metallic foundation layer 62 in the region where the resist mask 64 has been removed; and a process for partially removing the substrate 61 by executing dry etching processing to the substrate 61 through the metallic mask 65, and forming a groove part 67 on the substrate 61. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008003292(A) 申请公布日期 2008.01.10
申请号 JP20060172542 申请日期 2006.06.22
申请人 SEIKO EPSON CORP 发明人 SHINPO AKIRA;UEJIMA SHUNJI;FURUHATA HIDEMICHI
分类号 G02B5/02;G02F1/1335;G09F9/00 主分类号 G02B5/02
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