发明名称 SINGLE CRYSTAL SiC AND PRODUCTION METHOD THEREFOR, AND APPARATUS FOR PRODUCING SINGLE CRYSTAL SiC
摘要 PROBLEM TO BE SOLVED: To provide a high quality, long single crystal SiC having a large diameter in which the occurrence of defects such as micropipes is suppressed. SOLUTION: A production method for the single crystal SiC includes the steps of: fixing a SiC seed single crystal wafer 4 to a susceptor; and growing the single crystal SiC by continuously supplying raw materials for producing the single crystal SiC onto the SiC seed single crystal wafer 4 from outside, wherein the average temperature gradient of the susceptor 5, the SiC seed single crystal wafer 4 and the single crystal SiC having an increased thickness with growth is set to be within the range of 0.5 to 9°C/mm, the average temperature gradient being in the vertical direction (longitudinal direction) of the susceptor 5. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008001569(A) 申请公布日期 2008.01.10
申请号 JP20060173699 申请日期 2006.06.23
申请人 SHIN ETSU CHEM CO LTD 发明人 IKARI MASANORI;KANENIWA TORU;ABE TAKAO
分类号 C30B29/36;C30B1/10 主分类号 C30B29/36
代理机构 代理人
主权项
地址