发明名称 METHOD OF MICROWAVE PLASMA TREATMENT AND APPARATUS THEREFOR
摘要 <p>It is intended to generate a plasma of high electron density at low temperature and carry out plasma treatment therewith. There is provided a method comprising performing a microwave excitation of plasma generation gas to thereby generate plasma and exposing a treatment object thereto so as to attain plasma treatment of the treatment object, wherein either a mixed gas consisting of Xe gas and Ne gas or Xe gas alone is used as the plasma generation gas.</p>
申请公布号 WO2008004318(A1) 申请公布日期 2008.01.10
申请号 WO2006JP317994 申请日期 2006.09.11
申请人 ADTEC PLASMA TECHNOLOGY CO., LTD.;FUKASAWA, TAKAYUKI;RAMASAMY, RAJU;YASUDA, TOHRU;FUJII, SHUITSU;KAJIYAMA, HIROSHI;SHINODA, TSUTAE 发明人 FUKASAWA, TAKAYUKI;RAMASAMY, RAJU;YASUDA, TOHRU;FUJII, SHUITSU;KAJIYAMA, HIROSHI;SHINODA, TSUTAE
分类号 H05H1/24;C23C16/511 主分类号 H05H1/24
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