| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a load lock chamber adaptive to a wider variation in a range of a delivery and receipt position of a substrate, and to provide an exposure device provided with the load lock chamber. <P>SOLUTION: The load lock chamber is provided with: a chassis which defines a sealed space, the chassis arranged in between a first ambient gas and a second ambient gas; an exhausting means for evacuating the chassis; a first opening which is formed in the chassis to open to the first ambient gas; a first gate valve for opening/closing the first opening; a second opening which is formed in the chassis to open to the second ambient gas; and a second gate valve for opening/closing the second opening; in which the first opening is provided extending in a horizontal direction to open toward a plurality of directions. <P>COPYRIGHT: (C)2008,JPO&INPIT |
