发明名称 |
ILLUMINATION DEVICE, ILLUMINATION METHOD AND PATTERN INSPECTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a uniform illumination light by reducing interference in the illumination device that uses coherent light. <P>SOLUTION: The illumination device irradiating an objective body with unitized lines of light flux comprises a first dividing part for dividing coherent light into a plurality of lines of light flux by reflecting; first detour optical paths, in which the divided optical flux passes through having optical path difference longer than or equal to the coherent distance; an optical path difference formation material, arranged with at least a part of one first detour optical path making optical path difference larger than or equal to the coherence distance between the first detour optical path that is not arranged with the optical path difference forming material; and a first composite part with the unified plurality of lines of optical flux passing through the first detour optical path. <P>COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008002807(A) |
申请公布日期 |
2008.01.10 |
申请号 |
JP20060169513 |
申请日期 |
2006.06.20 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY KK;TOPCON CORP |
发明人 |
OGAWA TSUTOMU;SUZUKI HITOSHI;NAGAHAMA HIROYUKI |
分类号 |
G01B11/24;G01N21/84;G01N21/956;H01L21/027 |
主分类号 |
G01B11/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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