摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a microlens of good precision especially in a case that the quantity of SAG is little. SOLUTION: A photoresist 2 is applied to the surface of a substrate (optical base material) formed of quartz or glass (a). Then, the photoresist 2 is photosensitized using a main GSM 3 so as to obtain a predetermined microlens array in a case that the photoresist 2 is developed (b). This exposure is performed for a relatively long time so as to roughly determine the shape of the microlens array. Next, the photoresist 2 is photosensitized using a shape correcting GSM 4 to adjust the shape of the microlens array obtained by the photosensitization using the main GSM 3 (c). In a case that the gray scale value range of the main GSM 3 is set to G1-G2 and the gray scale value range of the shape correcting GSM 4 is set to g1-g2, the relation of G1<g1<g2<G2 is formed. COPYRIGHT: (C)2008,JPO&INPIT
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