发明名称 MODULAR CVD EPI 300MM REACTOR
摘要 <p>The present invention provides methods and apparatus for processing semiconductor substrates. Particularly, the present invention provides a modular processing cell to be used in a cluster tool. The modular semiconductor processing cell of the present invention comprises a chamber having an inject cap, a gas panel module configured to supply one or more processing gas to the chamber through the inject cap, wherein the gas panel module is position adjacent the inject cap. The processing cell further comprises a lamp module positioned below the chamber. The lamp module comprises a plurality of vertically oriented lamps.</p>
申请公布号 WO2008005754(A2) 申请公布日期 2008.01.10
申请号 WO2007US72121 申请日期 2007.06.26
申请人 APPLIED MATERIALS, INC.;BURROWS, BRIAN H.;METZNER, CRAIG R.;DEMARS, DENNIS L.;ANDERSON, ROGER N.;CHACIN, JUAN M.;CARLSON, DAVID K.;ISHIKAWA, DAVID MASAYUKI;CAMPBELL, JEFFREY;COLLINS, RICHARD O.;MAGILL, KEITH M.;AFZAL, IMRAN 发明人 BURROWS, BRIAN H.;METZNER, CRAIG R.;DEMARS, DENNIS L.;ANDERSON, ROGER N.;CHACIN, JUAN M.;CARLSON, DAVID K.;ISHIKAWA, DAVID MASAYUKI;CAMPBELL, JEFFREY;COLLINS, RICHARD O.;MAGILL, KEITH M.;AFZAL, IMRAN
分类号 H01J9/38 主分类号 H01J9/38
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