发明名称 Silicide-silicon oxide-semiconductor antifuse device and method of making
摘要 An antifuse contains a first silicide layer, a grown silicon oxide antifuse layer on a first surface of the first silicide layer, and a first semiconductor layer having a first surface in contact with the antifuse layer.
申请公布号 US2008009105(A1) 申请公布日期 2008.01.10
申请号 US20070898622 申请日期 2007.09.13
申请人 SANDISK 3D LLC 发明人 HERNER S. B.
分类号 H01L21/28;H01L23/525 主分类号 H01L21/28
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