POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS

摘要

A positive type resist composition is provided to obtain a resist material suitable for a microprocessing process and having excellent resolution, dependency on compression and mask fidelity. A positive type resist composition comprises: (A) a resist component having a carboxylic acid moiety protected with an acetal protecting group decomposed under the action of an acid; and (B) a compound capable of generating an acid in response to active rays or radiations, wherein deprotection of the carboxylic acid moiety protected with an acetal protecting group of the resin component is not performed by a beta-deprotecting reaction.