| 摘要 |
A substrate processing apparatus comprising an antenna elevation unit is provided to control simply and promptly plasma density in a chamber by driving the antenna elevation unit to control a height of an RF(Radio Frequency) antenna. A chamber configures a certain reactive space. Plural antenna units(110,120) comprised of one or more roof type antennas are sequentially arranged on an upper portion of the chamber from a central section to a peripheral section. An antennal elevation unit(130) elevates at least one of the antenna units. An RF power(17) supplies RF power to each antenna unit. The antenna elevation unit includes a driving unit for providing driving force, and a supporting member. The supporting unit is connected to the driving unit to move up and down. The supporting unit supports the antenna unit. The driving unit is a motor, an oil pressure cylinder, or a pneumatic cylinder.
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