发明名称 |
Process for cleaning polysilicon fragments |
摘要 |
<p>Purification of polycrystalline silicon fragment on a metal content of greater than 100 ppbw comprises introducing a polysilicon fraction into an aqueous cleaning solution containing hydrogen fluoride and hydrogen peroxide, removing the aqueous cleaning solution, washing the obtained polysilicon fraction with highly pure water and subsequently drying.</p> |
申请公布号 |
EP1876143(A1) |
申请公布日期 |
2008.01.09 |
申请号 |
EP20070111411 |
申请日期 |
2007.06.29 |
申请人 |
WACKER CHEMIE AG |
发明人 |
WOCHNER, HANNS;GOSSMANN, CHRISTIAN;LINDNER, HERBERT |
分类号 |
C01B33/037 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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