发明名称 |
An improved CPL mask and a method and program product for generating the same |
摘要 |
<p>A method of generating a mask for printing a pattern including a plurality of features. The method includes the steps of depositing a layer of transmissive material having a predefined percentage transmission on a substrate; depositing a layer of opaque material on the transmissive material; etching a portion of the substrate, the substrate being etched to a depth based on an etching selectivity between the transmissive layer and the substrate; exposing a portion of the transmissive layer by etching the opaque material; etching the exposed portion of the transmissive layer so as to expose an upper surface of the substrate; where the exposed portions of the substrate and the etched portions of the substrate exhibit a predefined phase shift relative to one another with respect to an illumination signal.</p> |
申请公布号 |
EP1876494(A1) |
申请公布日期 |
2008.01.09 |
申请号 |
EP20070252695 |
申请日期 |
2007.07.05 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
VAN DEN BROEKE, DOUGLAS;WAMPLER, KURT E.;CHEN, JANG FUNG |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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