发明名称 Formaldehyde free electrolesss copper compositions
摘要 <p>Electroless copper and copper alloy plating baths comprising one or more chelating agents chosen from hydantoin and hydantoin derivatives and pyruvaldehyde are disclosed. The electroless baths are formaldehyde free and are environmentally friendly. The electroless baths are stable and deposit a bright copper or copper alloy on substrates.</p>
申请公布号 EP1876259(A2) 申请公布日期 2008.01.09
申请号 EP20070252711 申请日期 2007.07.05
申请人 ROHM AND HAAS ELECTRONIC MATERIALS, LLC 发明人 POOLE, MARK A.;COBLEY, ANDREW J.;SINGH, AMRIK;HIRST, DEBORAH V.
分类号 C23C18/16;C23C18/38 主分类号 C23C18/16
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