| 摘要 |
<p>Manufacturing an object (40) with a first and a second surface area with different friction coefficients using a treatment chamber for carrying out physical vapor deposition (PVD) process, comprises carrying out at least two PVD coating operations simultaneously in the treatment chamber, where the first PVD coating process is carried out with a relatively directed vapor stream from a target or multiple targets composed of e.g. boron, vanadium and chromium, and the second PVD coating process is carried out with a relatively less directed or non-directed vapor stream composed of carbon. Manufacturing an object (40) with a first and a second surface area with different friction coefficients using a treatment chamber, which is preferably equipped with a rotating carrier (32) for the object or many such objects and is suitable for carrying out physical vapor deposition (PVD) process, comprises carrying out at least two PVD coating operations simultaneously in the treatment chamber, where the first PVD coating process is carried out with a relatively directed vapor stream from a target or multiple targets, which is/are composed of one or more of the elements boron, silicon, titanium, vanadium, chromium, zirconium, niobium, molybdenum, hafnium, tantalum, tungsten, carbides of the above elements and carbon, to form a homogeneous layer consisting of a carbide of one or more of the above elements and carbon with a relatively low proportion of carbon and a relatively high friction coefficient in the range of approximately 0.8 on the first surface area (42), and the second PVD coating process is carried out with a relatively less directed or non-directed vapor stream composed of carbon, to form a homogeneous layer composed of a carbide of one or more of the above elements and carbon with a relatively high carbon proportion and a relatively low friction coefficient in the range of approximately 0.2 on the second surface area (44).</p> |
