Plasma reactor with mechanical substrate holder

摘要

The reactor for etching a semiconductor substrate (2) or depositing chemical vapor assisted by plasma on the substrate, comprises a plasma source, a carrier-substrate (3), a unit (4) for polarizing the substrate and the carrier-substrate, and a mechanical maintenance unit (30) for covering the substrate against the carrier-substrate. The mechanical maintenance unit comprises an electrically insulating material that opposes the polarization of the maintenance unit by contact with the substrate. The electrically insulating material is covered with an electrically conducting aluminum film (34). The reactor for etching a semiconductor substrate (2) or depositing chemical vapor assisted by plasma on the substrate, comprises a plasma source, a carrier-substrate (3), a unit (4) for polarizing the substrate and the carrier-substrate, and a mechanical maintenance unit (30) for covering the substrate against the carrier-substrate. The mechanical maintenance unit comprises an electrically insulating material that opposes the polarization of the maintenance unit by contact with the substrate. The electrically insulating material is covered with an electrically conducting aluminum film (34) in a zone of contact with the substrate. Electrical connection unit is arranged to connect the carrier-substrate to a ground of the conducting film. The electrically insulating material forms an insulating body of the maintenance unit. The maintenance unit comprises a metallic body connected to the ground. A layer of the insulating material covers the metallic body according to a support face against the substrate. The electrical connection unit is repelled by the maintenance unit towards the carrier-substrate, when the conducting film is resting against a periphery of an active face of the substrate, and exceeds beyond the surface of the carrier-substrate, when the maintenance unit differs from the substrate active face. The electrical connection unit ensures a conduction of calorific energy simultaneously to the electricity conduction between the carrier-substrate and the maintenance unit. The mechanical maintenance unit comprises a maintenance ring.