| 摘要 |
An electrode pattern for a resistance heating element and a substrate treating apparatus provide the maximum temperature uniformity by compensating a thermal loss generated from a part adjacent to a contact region, an electrical contact portion, and a through-hole. A substrate treating apparatus includes a top surface and a disk-like substrate. The top surface is used as a substrate supporting surface. The disk-like substrate includes a conductive electrode included in the disk-like substrate. The top surface includes at least one functional component having a shortest size X. The functional component is any one of electrical contacts(4,5), taps(8,9), an interposer, and through-holes(6.7). The conductive electrode has a path formed in a predetermined pattern. The conductive electrode is connected to an external power source for heating the substrate provided on the substrate supporting surface.
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