发明名称 SEMICONDUCTOR SUBSTRATE DEFECTS DETECTION DEVICE AND METHOD OF DETECTION OF DEFECTS
摘要 A defect detection device and a method of detecting a defect are provided to decrease a lead time in a fabricating process by preventing an overlapping defect from being detected in a review detection. A defect of a substrate is detected in every fabricating process of a layer, and defect information about discriminating the defect is generated. An information generating unit compares the defect information of the substrate generated in detection of an uppermost layer with the defect information of the substrate generated in detection of a lower layer to generate notice defect information for discriminating defect generated in the uppermost layer except defects overlapping the defect of the lower layer. A determination unit determines a taking-out point of the substrate according to the notice defect information.
申请公布号 KR20080003719(A) 申请公布日期 2008.01.08
申请号 KR20070065521 申请日期 2007.06.29
申请人 OLYMPUS CORPORATION 发明人 ONISHI TAKAAKI
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
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