发明名称 Semiconductor device having super junction structure and method for manufacturing the same
摘要 A semiconductor device includes: a center region; a periphery region; and a semiconductor layer including pairs of a first region having a first impurity amount and a second region having a second impurity amount. The first and the second regions are alternately aligned in a plane. The periphery region includes an utmost outer and an utmost inner periphery pairs. The utmost outer periphery pair has a difference between the second and the first impurity amounts, which is smaller than a maximum difference in the periphery region. The utmost inner periphery pair has a difference between the second and the first impurity amounts, which is larger than a difference in the center region.
申请公布号 US7317213(B2) 申请公布日期 2008.01.08
申请号 US20050211524 申请日期 2005.08.26
申请人 DENSO CORPORATION 发明人 YAMAGUCHI HITOSHI;MAKINO TOMOATSU;HATTORI YOSHIYUKI;OKADA KYOKO
分类号 H01L29/74;H01L29/36;H01L29/417;H01L31/111 主分类号 H01L29/74
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