发明名称 Wiring pattern formation method, manufacturing method for multi layer wiring substrate, and electronic device
摘要 A wiring pattern formation method in which a wiring pattern is formed by arranging, in a region which is demarcated by a partition wall, liquid material which includes an electrically conductive material, including: arranging a resin material around the periphery of a region upon which the wiring pattern is to be formed; imparting liquid affinity to a demarcated region which has been demarcated by the resin material; narrowing down the demarcated region by flowing out the resin material towards and into the demarcated region; and forming the partition wall by curing the resin material.
申请公布号 US7316974(B2) 申请公布日期 2008.01.08
申请号 US20050235634 申请日期 2005.09.26
申请人 SEIKO EPSON CORPORATION 发明人 UEHARA NOBORU;SHINTATE TSUYOSHI;SAKURADA KAZUAKI
分类号 H01L21/44 主分类号 H01L21/44
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