AN APPARATUS FOR FORMING FILM AND A METHOD THEREOF

摘要

An apparatus and a method for forming a film are provided to allow the thickness of a prepared film to be uniform by uniformly spraying gas through a plurality of spray valves disposed at various positions. An apparatus for forming a film comprises a film forming chamber(2) having a substrate(W) therein, a plurality of spray valves(301,302,303) and a controller. The spray valves are installed at the film forming chamber at various positions and directly spray the same liquid material into the film forming chamber. The spray valves are symmetrically installed with respect to the center axis of the substrate. The spray valves are installed at the same interval. The controller periodically open and close the spray valves and intermittently supplies the film forming chamber with the liquid material.