FLAT TRANSMITTANCE MODULATION(TM) BLANK MASK AND PHOTOMASK USING THE SAME

摘要

A flat transmittance modulation(TM) blank mask and a photomask using the same are provided to improve productivity in a process by providing a semi-permeable membrane which is easy to examine in an examination wavelength. A flat transmittance modulation blank mask is formed by stacking any one of a light shielding film, a semi-permeable film, and an anti-reflection film on a transparent substrate and then coating photoresist on the stacked substrate. A difference in transmittance of the semi-permeable film in wavelengths of I-line(365 nm), h-line(405 nm), and g-line(436 nm) is 5 % or less. The transmittance in the wavelengths is in the range of 10 to 90 %. A thickness of the semi-permeable film in the wavelengths is in the range of 5 to 70 nm. The transmittance of a front side of the semi-permeable film is in the range of 5 to 70 % in any one wavelength of the wavelengths in the range of 300 to 600 nm. A difference between the transmittance of the front side of the semi-permeable film and the transmittance of a surface of the light shielding film or the anti-reflection film is in the range of 5 to 60% in any one wavelength of the wavelengths in the range of 300 to 600 nm.