| 摘要 |
<p>An exposure system is provided to ensure excellent transfer precision, resolution and throughput by preventing bubble generation in a liquid used for liquid immersion exposure and a change in pressure of the liquid. An exposure system comprises: a wafer stage for holding a wafer(40); an optical projection unit(30) for projecting light from a reticle and having a final optical element(31) opposite to the wafer; and a nozzle member(100) having a surface opposite to the wafer. The exposure system carries out exposure by way of the reticle, the optical projection unit and a liquid filled in a gap(102) between the final surface and the wafer. The surface of the nozzle member opposite to the wafer includes: a feeding port(101) for feeding the liquid to the gap and formed in parallel with the plane perpendicular to the optical axis of the final optical element; a first recovering port(103) for recovering the liquid from the gap and spaced apart from the optical axis by a longer distance than the feeding port; and a region including a first portion(114) formed between the feeding port and the first recovering port in parallel with the surface perpendicular to the optical axis, and a second portion(111) formed between the feeding port and the first portion and having an inclined surface approaching the wafer as the distance from the optical axis decreases, wherein the first distance between the first portion and the wafer is longer than the second distance between the feeding port and the wafer.</p> |
