| 摘要 |
An LCD and a fabrication method thereof are provided to increase an aperture area of a pixel part by forming an active pattern only on a gate electrode in an island shape without being formed under a data line. A first substrate divided into a pixel part, a first pad part and a second part is provided. A gate electrode(321) and a gate line(316) are formed at the pixel part of the first substrate through a first mask process. An island-shaped active pattern(324) is formed on the gate electrode through a second mask process in a state where the first insulating layer is interposed therebetween, and an n+ amorphous silicon thin film pattern and a conductive layer pattern are formed on the active pattern. A source electrode(322) and a drain electrode are formed at the pixel part of the first substrate through a third mask process, and the pixel electrode is formed such that a pixel electrode pattern patterned in the same shape as the pixel electrode remains on the pixel electrode. A second insulating layer is formed on the first substrate through a fourth mask process. A portion of the second insulating layer and the pixel electrode pattern are removed through a fourth mask process to expose the pixel electrode. The first substrate and the second substrate are bonded with each other.
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