SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME

摘要

A semiconductor device and a method for fabricating the same are provided to monitor accurately a thickness of a fuse by forming a monitoring pattern. A semiconductor substrate includes a fuse region(102) and a monitoring region. A plurality of fuses are positioned on an insulating layer of the fuse region. The fuses are exposed through a fuse window(162). A monitoring pattern is positioned on the same layer as the layer of the fuses in the monitoring region. The monitoring pattern is formed with a plurality of sub-patterns which are exposed through the monitoring window. The sub-patterns are separated from each other in order to expose the insulating layer therebetween. The sub-patterns are formed with a linear structure.