| 摘要 |
<p>An exposure apparatus and a method of manufacturing a device are provided to correct a light-quantity detector(a second detector) installed on a substrate stage by using a third detector. An exposure apparatus includes a light source(1), an illumination optical system(2), a substrate stage, a projection optical system(5), a first detector(9), a second detector(13), a calculator. The light source emits light. The illumination optical system illuminates an original plate with the light. The substrate stage holds the substrate. The projection optical system projects the light from the original plate illuminated by the illumination optical system. The first detector detects a light quantity of the light emitted from the light source and passing on a light path of the illumination optical system. The second detector is installed on the substrate stage and detects a light quantity of the light emitted from the light source and transmitted through the illumination optical system and the projection optical system. The calculator determines a first conversion factor with respect to a plurality of exposure conditions.</p> |
